The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.

This edited volume, first published in 2007, comprehensively covers the focused ion beam and two beam technology.

About the Author
NAN YAO holds several positions at Princeton University, New Jersey. He is director of the Imaging and Analysis Center; Senior Research Scholar at the Institute for the Science and Technology of Materials; and a lecturer in Mechanical and Aerospace Engineering.


Book Information
ISBN 9780521831994
Author Nan Yao
Format Hardback
Page Count 408
Imprint Cambridge University Press
Publisher Cambridge University Press
Weight(grams) 850g
Dimensions(mm) 244mm * 170mm * 24mm