Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications.
Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that:
From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
About the Author
Emile Knystautas
Book Information
ISBN 9780367393052
Author Emile Knystautas
Format Paperback
Page Count 592
Imprint CRC Press
Publisher Taylor & Francis Ltd
Weight(grams) 1100g
