Chance is a photography magazine that looks at the world through the lens of theater and design. We produce and original photo shoot of nearly every production we cover, and believe that superior documentation can change the way we think and write about the theater and the artists who create for it. A calm, noise free place to engage with the aesthetics of design in detail, Chance integrates all of the arts, material and non material, into a single space where the poetry of human thought can expand our desire for a more provocative and lifted engagement with design. Our editorial team of 30 artists have worked for more than a year to bring you Chance 3, Couture | Stage, representing the work of the artists in C3 in a manner more pointed, refined and convincing than you may have ever seen them before. In C3 we traveled to Europe for fresh shoots of the work of Eiko Ishioka and Rudolf Nureyev. We've developed beautiful portfolios on the work of Simon Doonan, Ming Cho Lee and Mark Wendland. More comprehensively, we look at the career of Kenneth Collins of Temporary Distortion, while Charles Renfro gives us fresh insights into DSR's redesign of Lincoln Center. Then we head off the grid, downtown, for performance shoots of Company XIV and The Mad Ones. Chance is literature over script, high rez over low rez. When the image is about seeing and not selling, the art of photography comes alive. Chance is a revolution in theatrical photography. No other artist is more perfectly poised to undertake an examination of our noisebound culture than those in theater, and no other publication better frames this conversation than Chance. There's a lot going on. Chance is looking and listening. Join us.

Book Information
ISBN 9780990569404
Author Chance Magazine Editorial Staff
Format Paperback
Page Count 228
Imprint Chance
Publisher Chance
Weight(grams) 978g